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Hierarchical multi-level block copolymer patterns by multiple self-assembly

Title
Hierarchical multi-level block copolymer patterns by multiple self-assembly
Author
성기훈
Keywords
NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; TEMPLATES
Issue Date
2019-05
Publisher
ROYAL SOC CHEMISTRY
Citation
NANOSCALE, v 11, NO 17, Page. 8433-8441
Abstract
Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high . The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (approximate to 800 degrees C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.
URI
https://pubs.rsc.org/en/content/articlelanding/2019/NR/C9NR00774A#!divAbstracthttps://repository.hanyang.ac.kr/handle/20.500.11754/151194
ISSN
2040-3364; 2040-3372
DOI
10.1039/c9nr00774a
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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