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dc.contributor.advisor안진호-
dc.contributor.author심규현-
dc.date.accessioned2020-03-26T17:04:34Z-
dc.date.available2020-03-26T17:04:34Z-
dc.date.issued2011-02-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/140097-
dc.identifier.urihttp://hanyang.dcollection.net/common/orgView/200000416352en_US
dc.description.abstract본 연구는 나노임프린트와 포토리소그래피를 동시에 적용할 수 있는 SMM(Stamp mold mask)의 제작을 통하여 나노임프린트 리소그래피와 포토리소그래피를 결합한 새로운 공정으로 기존 나노임프린트로 구현하기 어려웠던 high aspect ratio ( >4)패턴을 구현하였다.-
dc.publisher한양대학교-
dc.title복합적 임프린트 기술을 이용한 High aspect ratio 패턴형성 공정개발-
dc.title.alternativeProcess development for high aspect ratio patterns using combined imprint techniques-
dc.typeTheses-
dc.contributor.googleauthor심규현-
dc.contributor.alternativeauthorShim, Kyuhyun-
dc.sector.campusS-
dc.sector.daehak대학원-
dc.sector.department신소재공학과-
dc.description.degreeMaster-
dc.contributor.affiliation신소재공학-
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > MATERIALS SCIENCE & ENGINEERING(신소재공학과) > Theses (Master)
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