전력공급방식에 따른 유도결합 플라즈마 특성 변화 연구

Abstract

In the inductively coupled plasma(ICP), conventional plasma discharge system includes the antenna that one end is connected to a power supply and the other end is connected to the ground. In this constitution, it develops high voltages between the powered end and grounded end of the antenna which cause capacitive coupling, leading to the ion energy loss and the dielectric erosion. In order to reduce this phenomenon, the balanced power was applied to the antenna by placement of balun transformer between impedance matching network and discharge antenna. Experiment performed at balanced powered system and conventional system in order to study the change of plasma characteristic depending on power feeding method. In comparison with the conventional power, plasma density increased and the electron temperature decreased in balanced system. These results may be due to the decrease of capacitive coupling.