Growth of highly-oriented diamond films on 6H-SiC(0001) and Si(111) substrates and the effect of carburization
- Title
- Growth of highly-oriented diamond films on 6H-SiC(0001) and Si(111) substrates and the effect of carburization
- Author
- 박진석
- Keywords
- Highly-oriented diamond; Si (111); 6H–SiC (0001); Carburization; Bias-enhanced nucleation; β-SiC layer; Raman; XPS; XRD
- Issue Date
- 2004-01
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- Thin Solid Films, v. 447–448, No. 30, Page. 231-238
- Abstract
- The growth of highly oriented diamond is performed on Si (111) and 6H-SiC (0001) substrates via two-step and three-step processes using microwave plasma CVD. The two-step process involves bias-enhanced nucleation (BEN) and deposition, and the three-step process involves carburization in addition to the two-step process. The diamond films grown on the Si (111) substrate exhibit high quality and desirable (111)-orientation under the carburization condition of 5.3 X 10(3) Pa in pressure with no bias applied. The mechanism for the formation of conversion layer during the carburization step is investigated on both the substrates through the Raman and X-ray photoelectron spectroscopy (XPS) studies. The results indicate that the carburization mainly composed of beta-SiC, which plays a crucial role for the formation of the conversion layer and which eventually promotes the diamond nucleation. It is also suggested that a highly-oriented and high-quality diamond film can be successfully achieved by carburization.
- URI
- https://www.sciencedirect.com/science/article/pii/S0040609003010988?via%3Dihubhttps://repository.hanyang.ac.kr/handle/20.500.11754/131994
- ISSN
- 0040-6090
- DOI
- 10.1016/S0040-6090(03)01098-8
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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