Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진구 | - |
dc.date.accessioned | 2019-12-09T17:14:12Z | - |
dc.date.available | 2019-12-09T17:14:12Z | - |
dc.date.issued | 2018-10 | - |
dc.identifier.citation | COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, v. 555, page. 72-79 | en_US |
dc.identifier.issn | 0927-7757 | - |
dc.identifier.issn | 1873-4359 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S092777571830582X?via%3Dihub | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/120270 | - |
dc.description.abstract | Under extreme ultraviolet (EUV) exposure, the surfaces of EUV mask and optics are exposed to hydrocarbon contaminant, which reduces the imaging performance and lifetime of EUV mask. Thus, an efficient method is required to remove hydrocarbon contaminant from the mask surface. In this work, a mixture of alkaline chemicals and organic solvents has been proposed for the removal of EUV exposed hydrocarbon contaminant from Ru (Ruthenium) capping layer of EUV mask. A hydrocarbon film with similar properties to EUV hydrocarbon contaminant was prepared by PECVD (plasma enhanced chemical vapor deposition). The hydrocarbon removal efficiency was evaluated by using four kinds of quaternary ammonium hydroxides as alkaline chemicals, and DMSO (dimethyl sulfoxide) and THE (tetrahydrofuran) as polar aprotic organic solvents. Among the alkaline chemicals, tetrabutyl ammonium hydroxide, together with an organic solvent, produced effective removal of hydrocarbon from Ru. Removal of hydrocarbon film using a higher polar organic DMSO solvent required a higher concentration and longer time than THF. The combination of megasonic power and cleaning chemistry enhanced the hydrocarbon removal efficiency significantly. | en_US |
dc.description.sponsorship | This work was supported by the Future Semiconductor Device Technology Development Program#10045366 funded by MOTIE (Ministry of Trade, Industry & Energy) and KSRC (Korea Semiconductor Research Consortium). | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | ELSEVIER SCIENCE BV | en_US |
dc.subject | EUV mask | en_US |
dc.subject | Hydrocarbon contaminant | en_US |
dc.subject | Cleaning | en_US |
dc.subject | Ruthenium surface | en_US |
dc.subject | Megasonic cleaning | en_US |
dc.title | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | en_US |
dc.type | Article | en_US |
dc.relation.no | 20 | - |
dc.relation.volume | 555 | - |
dc.identifier.doi | 10.1016/j.colsurfa.2018.06.067 | - |
dc.relation.page | 72-79 | - |
dc.relation.journal | COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS | - |
dc.contributor.googleauthor | Kim, Min-Su | - |
dc.contributor.googleauthor | Purushothaman, Muthukrishnan | - |
dc.contributor.googleauthor | Kim, Hyun-Tae | - |
dc.contributor.googleauthor | Song, Hee-Jin | - |
dc.contributor.googleauthor | Kim, Young-Woong | - |
dc.contributor.googleauthor | Ahn, Jin-Ho | - |
dc.contributor.googleauthor | Oh, Hye-Keun | - |
dc.contributor.googleauthor | Park, Jin-Goo | - |
dc.relation.code | 2018002025 | - |
dc.sector.campus | S | - |
dc.sector.daehak | GRADUATE SCHOOL[S] | - |
dc.sector.department | DEPARTMENT OF BIONANOTECHNOLOGY | - |
dc.identifier.pid | jgpark | - |
dc.identifier.researcherID | P-4051-2019 | - |
dc.identifier.orcid | http://orcid.org/0000-0002-8008-6478 | - |
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