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Perovskite Nanoparticle Composite Films by Size Exclusion Lithography

Title
Perovskite Nanoparticle Composite Films by Size Exclusion Lithography
Author
강영종
Keywords
composite; lithography; mass-transfer; perovskite; size exclusion
Issue Date
2018-07
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED MATERIALS, v. 30, no. 39, Article no. 1802555
Abstract
Perovskite nanoparticle composite films with capability of high-resolution patterning (>= 2 mu m) and excellent resistance to various aqueous and organic solvents are prepared by in situ photosynthesis of acrylate polymers and formamidinium lead halide (FAPbX(3)) nanoparticles. Both positive- and negative-tone patterns of FAPbX(3) nanoparticles are created by controlling the size exclusive flow of nanoparticles in polymer networks. The position of nanoparticles is spatially controlled in both lateral and vertical directions. The composite films show high photoluminescence quantum yield (up to 44%) and broad color tunability in visible region (lambda(peak) = 465-630 nm).
URI
https://onlinelibrary.wiley.com/doi/abs/10.1002/adma.201802555https://repository.hanyang.ac.kr/handle/20.500.11754/119292
ISSN
0935-9648; 1521-4095
DOI
10.1002/adma.201802555
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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