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High-Performance Amorphous InGaZnO Thin-Film Transistors via Staked Ultrathin High-k TaOx Buffer Layer Grown on Low-k SiO2 Gate Oxide

Title
High-Performance Amorphous InGaZnO Thin-Film Transistors via Staked Ultrathin High-k TaOx Buffer Layer Grown on Low-k SiO2 Gate Oxide
Author
홍진표
Keywords
IGZO TFTs; tantalum oxide; thermalization energy; thin film transistors
Issue Date
2017-05
Publisher
WILEY
Citation
ADVANCED ELECTRONIC MATERIALS, v. 3, no. 3, Article no. 1600452
URI
https://onlinelibrary.wiley.com/doi/abs/10.1002/aelm.201600452https://repository.hanyang.ac.kr/handle/20.500.11754/114031
ISSN
2199-160X
DOI
10.1002/aelm.201600452
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > PHYSICS(물리학과) > Articles
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