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Characteristics of band modulation FET on sub 10 nm SOI

Title
Characteristics of band modulation FET on sub 10 nm SOI
Author
안진호
Keywords
MOS I-MOS; IMPACT-IONIZATION; LOW-POWER; CAPACITORLESS 1T-DRAM; NEGATIVE CAPACITANCE; PERFORMANCE; TRANSISTORS; CHANNEL; MOSFETS; FDSOI
Issue Date
2019-04
Publisher
IOP PUBLISHING LTD
Citation
Japanese Journal of Applied Physics, v. 58, NO SB, no. SBBB07
Abstract
The electrical characteristics of band modulation FET are investigated with energy band diagrams between drain to source through intrinsic gate region according to front/back gates and drain bias conditions. The drain current-voltage and transfer characteristics show extremely steep slope with minimum subthreshold swing of 1.6 mV/decade. Memory window is 0.27 V, which is determined with turn on voltages at "0" and "1" states through multiple cycles of write and read operations. Memory performance also shows that current margin to distinguish the "0" and "1" state has the maximum value of over 100 mu A at V-D of 1.2 V. But, the current margin is relatively less affected by the front and back gate bias under the conditions that V-D is applied in the memory window range and the current at "0" state remains low. (C) 2019 The Japan Society of Applied Physics
URI
https://iopscience.iop.org/article/10.7567/1347-4065/aafc9fhttps://repository.hanyang.ac.kr/handle/20.500.11754/108267
ISSN
0021-4922; 1347-4065
DOI
10.7567/1347-4065/aafc9f
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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