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dc.contributor.author김우희-
dc.date.accessioned2019-03-06T02:33:52Z-
dc.date.available2019-03-06T02:33:52Z-
dc.date.issued2017-01-
dc.identifier.citationJOURNAL OF COATINGS TECHNOLOGY AND RESEARCH, v. 14, No. 1, Page. 177-183en_US
dc.identifier.issn1945-9645-
dc.identifier.urihttps://link.springer.com/article/10.1007/s11998-016-9840-2-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/100506-
dc.description.abstractThin film optics, based on light interference characteristics, are attracting increasing interest because of their ability to enable a functional color coating for various applications in optical, electronic, and solar industries. Here, we report on the dependence of coloring characteristics on single-layer TiO2 thicknesses and alternating TiO2/Al2O3 multilayer structures prepared by atomic layer deposition (ALD) at a low growth temperature. The ALD TiO2 and Al2O3 thin films were studied at a low growth temperature of 80A degrees C. Then, the coloring features in the single-layer TiO2 and alternating TiO2/Al2O3 multilayers using both the ALD processes were experimentally examined on a TiN/cut stainless steel sheet. The Essential Macleod software was used to estimate and compare the color coating results. The simulation results revealed that five different colors of the single TiO2 layers were shown experimentally, depending on the film thickness. For the purpose of highly uniform pink color coating, the film structures of TiO2/Al2O3 multilayers were designed in advance. It was experimentally demonstrated that the evaluated colors corresponded well with the simulated color spectrum results, exhibiting a uniform pink color with wide incident angles ranging from 0A degrees to 75A degrees. This article advances practical applications requiring highly uniform color coatings of surfaces in a variety of optical coating areas with complex topographical structures.en_US
dc.description.sponsorshipThis work was supported by Incheon National University Research Grant in 2013.en_US
dc.language.isoen_USen_US
dc.publisherSPRINGERen_US
dc.subjectTiO2en_US
dc.subjectAl2O3en_US
dc.subjectColor coatingen_US
dc.subjectAtomic layer depositionen_US
dc.subjectTiO2/Al2O3 multilayeren_US
dc.titleUniform Color Coating of Multilayered TiO2/Al2O3 Films by Atomic Layer Depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s11998-016-9840-2-
dc.relation.journalJOURNAL OF COATINGS TECHNOLOGY AND RESEARCH-
dc.contributor.googleauthorKim, Woo-Hee-
dc.contributor.googleauthorKim, Hyungjun-
dc.contributor.googleauthorLee, Han-Bo-Ram-
dc.relation.code2017002880-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING-
dc.identifier.pidwooheekim-
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COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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