이선영
2019-11-26T01:48:35Z
2019-11-26T01:48:35Z
2019-05
Journal of the Korean Ceramic Society, v. 56, No. 3, Page. 317-324
1229-7801
http://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE08735867&language=ko_KR
https://repository.hanyang.ac.kr/handle/20.500.11754/114426
Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 x 10-2 μA/cm², and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.
ko_KR
한국세라믹학회
Electrical conductivity
Corrosion resistance
Cr-Diamond-like carbon film
Physical vapor deposition
Plasma-enhanced chemical vapor deposition
Development of highly conductive and corrosion-resistant Cr-Diamond-like Carbon Films
Article
3
56
317-324
Journal of the Korean Ceramic Society
Ko, Minjung
Jun, Yee Sle
Lee, Na Rae
Kang, Suhee
Moon, Kyoung Il
Lee, Caroline Sunyong
2019024209
E
COLLEGE OF ENGINEERING SCIENCES[E]
DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING
sunyonglee