| 2020-05 | Accelerated temperature and humidity testing of 2D SnS(2)thin films made via four-inch-wafer-scale atomic layer deposition | 전형탁 |
| 2014-02 | Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition | 전형탁 |
| 2017-04 | The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer deposition | 전형탁 |
| 2022-03 | Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment | 전형탁 |
| 2019-12 | Atomic layer deposition growth of SnS2 films on diluted buffered oxide etchant solution-treated substrate | 전형탁 |
| 2020-11 | Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water) | 전형탁 |
| 2012-12 | AZO/Au/AZO multilayer as a transparent conductive electrode | 전형탁 |
| 2020-12 | Carbon content control of silicon oxycarbide film with methane containing plasma | 전형탁 |
| 2015-03 | Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( (i) Pr-DAD)(2) | 전형탁 |
| 2016-01 | Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation | 전형탁 |
| 2017-04 | Characteristics of layered tin disulfide deposited by atomic layer deposition with H2S annealing | 전형탁 |
| 2018-01 | Characteristics of low-kappa SiOC films deposited via atomic layer deposition | 전형탁 |
| 2021-04 | Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition | 전형탁 |
| 2015-09 | Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (Cp-Me)W(CO)(2)(NO) for Cu diffusion barrier | 전형탁 |
| 2016-10 | Characterization of Cu-Mn/Ta Layer as Cu Diffusion Barrier on a Low-k Dielectric | 전형탁 |
| 2012-12 | Characterization of the Co film deposited by MOCVD using dicobalt (Hexacarbonyl) tert-butylacetylene and the CoSi2 film formed by a two-step annealing process with a Ti capping layer | 전형탁 |
| 2012-12 | Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications | 전형탁 |
| 2016-08 | Colossal Terahertz Nonlinearity in Angstrom- and Nanometer-Sized Gaps | 전형탁 |
| 2022-05 | Control of Transfer Characteristics of Atomic Layer Deposited Al-Doped SnO2 Thin Film through a Post-Annealing Process | 전형탁 |
| 2016-12 | Correlation of nanostructure changes with the electrical properties of molybdenum disulfide (MoS2) as affected by sulfurization temperature | 전형탁 |
