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Showing results 1 to 20 of 31

Issue DateTitleAuthor(s)
2020-06The adsorption and removal of corrosion inhibitors during metal CMP김태곤
2016-09Atomic resolution quality control for Fin oxide recess by atomic resolution profiler김태곤
2023-02Boosting performance of CdTe photocathode with pulse-reverse electrodeposited nickel telluride-nickel phosphide dual co-catalysts김태곤
2020-07Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application김태곤
2022-01Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant김태곤
2020-10Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process김태곤
2020-12Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process김태곤
2021-02Effect of Dissolved Oxygen on Removal of Benzotriazole from Co During a Post-Co CMP Cleaning김태곤
2022-05Effect of pH and Ion Concentration on Wetting of Nanoholes and Water Structuring김태곤
2022-05Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning김태곤
2022-08-22Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process김태곤
2022-11-15Effect of slurry particles on PVA brush contamination during post-CMP cleaning김태곤
2021-02The Effect of Thermal Aging on Nano-Particle Removal김태곤
2021-02Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND김태곤
2020-02Hybrid DHF and N-2 jet spray cleaning for silicon nitride and metal layer DRAM patterns김태곤
2016-10In-Line Critical Dimension and Sidewall Roughness Metrology Study for Compound Nanostructure Process Control by in-Line 3D Atomic Force Microscope김태곤
2019-10Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process김태곤
2023-08Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing김태곤
2021-04Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning김태곤
2021-02Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process김태곤

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