| 2016-12 | Characterization of ammonium silicate residue during Polysilazane (PSZ) dry etching in NF3/H2O gas chemistry | 박진구 |
| 2015-01 | Characterization of Cu-BTA Organic Complexes on Cu during Cu CMP and Post Cu Cleaning | 박진구 |
| 2014-12 | Characterization of Cu-BTA organic complexes on Cu during Cu CMP and post Cu cleaning | 박진구 |
| 2020-07 | Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application | 박진구 |
| 2018-04 | Characterization of Free-Standing Nano-Membranes by Using Ellipsometry | 박진구 |
| 2018-04 | Characterization of Free-Standing Nano-Membranes by Using Ellipsometry | 박진구 |
| 2014-06 | Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution | 박진구 |
| 2014-06 | Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution | 박진구 |
| 2007-06 | Characterization of SUS Molds for light guide-plates by electro-chemical fabrication (ECF) method | 박진구 |
| 2013-02 | Characterization of TMAH based cleaning solution for post Cu-CMP application | 박진구 |
| 2013-02 | Characterization of TMAH based cleaning solution for post Cu-CMP application | 박진구 |
| 2004-02 | Chemical and Mechanical Characterizations of the Passivation Layer of Copper in Organic Acid Based Slurries and its CMP Performance | 박진구 |
| 2007-04 | Chemical and nanomechanical characteristics of fluorocarbon thin films deposited by using plasma enhanced chemical vapor deposition | 박진구 |
| 2000-11 | Chemical, optical and tribological characterization of perfluoropolymer films as an anti-stiction layer in micro-mirror arrays | 박진구 |
| 2021-12 | Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant | 박진구 |
| 2011-08 | Citric Acid and NaIO(4) Based Alkaline Cleaning Solution for Particle Removal during Post-Ru CMP Cleaning | 박진구 |
| 2011-08 | Citric Acid and NaIO4 Based Alkaline Cleaning Solution for Particle Removal during Post-Ru CMP Cleaning | 박진구 |
| 2012-03 | CMP defects | 박진구 |
| 2011-12 | CMP defects | 박진구 |
| 2004-07 | CMP 공정중 전기화학적 방법과 마찰력을 이용하여 Cu Wafer와 Disc의 특성 비교 | 박진구 |
