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Problems of Using a Solvent-cleansed Silicon Oxide Substrate as the Friction Reference Sample at the Nanoscale

Title
Problems of Using a Solvent-cleansed Silicon Oxide Substrate as the Friction Reference Sample at the Nanoscale
Author
김수은
Keywords
Lateral Force Microscopy; LFM; Friction reference; Silicon oxide; Solvent
Issue Date
2018-08
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 73, No. 3, Page. 392-395
Abstract
For comparative friction studies, a reference sample, which holds stable and reproducible frictional characteristics, is required. Here, we have studied the frictional properties of native silicon oxide and silicon oxide formed through wet thermal oxidation by using lateral force microscopy. Once cleansed using solvents such as acetone, the friction measured on these frequently-used reference materials undergoes gradual change by a series of scanning. The friction is observed to increase with the number of scans and reaches about 1.5 times the initial value. We find that soft baking at 150 A degrees C - 200 A degrees C for 30 minutes can eliminate this problem.
URI
https://link.springer.com/article/10.3938/jkps.73.392http://repository.hanyang.ac.kr/handle/20.500.11754/81295
ISSN
0374-4884
DOI
10.3938/jkps.73.392
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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