Investigation of Surface Layer Formation for Fluorinated Carbon Film Using Fourier Transform Infrared Spectrometry Analysis

Title
Investigation of Surface Layer Formation for Fluorinated Carbon Film Using Fourier Transform Infrared Spectrometry Analysis
Author
이선영
Keywords
octafluorocyclobutane (C4F8); plasma enhanced chemical vapor deposition (PECVD); fluorinated carbon (FC) film; Fourier transform infrared spectrometer (FTIR); anti-stiction layer
Issue Date
2008-08
Publisher
INST PURE APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v. 47, No. 8, Page. 6422-6426
Abstract
Mechanism for fluorinated carbon film formation was investigated by varying pressure and substrate temperature to find the optimum deposition condition anti-stiction layer. The temperature and pressure were varied using design of experiment (DOE) method and C4F8 was used as a source gas in this study. Film was deposited by plasma-enhanced chemical vapor deposition (PECVD), and various properties of these films were measured, such as contact angle, surface energy, and thickness. Moreover, this film was characterized using Fourier transform infrared spectrometry (FTIR). From FTIR analysis, an extra peak at low temperature was detected and it was identified to be CF 2 which was not detected at 250 °C. It was found that more fluorine atoms decomposed at high temperature. Therefore, it was found that the decomposition of fluorine atoms at high temperature resulted the lowest thickness while at two lower temperatures, the strong chemical bond between Carbon and Fluorine atoms resulted thicker films.
URI
http://iopscience.iop.org/article/10.1143/JJAP.47.6422/metahttp://repository.hanyang.ac.kr/handle/20.500.11754/80634
ISSN
0021-4922
DOI
10.1143/JJAP.47.6422
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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