Ellipsometry for Pellicle-Covered Surface

Title
Ellipsometry for Pellicle-Covered Surface
Author
오혜근
Keywords
ellipsometry; lithography; photomask; haze; pellicle; SCATTEROMETRY
Issue Date
2008-08
Publisher
INST PURE APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v. 47, No. 8, Page. 6536-6539
Abstract
The photomask (PM) surface is covered with a pellicle to protect from dust and other airborne particles. However. a defect known as haze appears on the surface of the PM during exposure even with a pellicle cover. As lithography goes into the deeper UV, the photochemical reactions of contaminants become enhanced to form haze on the PM surface. This affects the lithography as haze absorbs or scatters UV. Ellipsometry may be an ideal technique for the early detection of a haze layer. However, when the PM is covered with a pellicle, the ellipsometric data collected from the surface become extremely distorted owing to the non-normal transmission through the pellicle. In this article, we introduce a novel technique so that the conventional ellipsometric data can be obtained without removing the pellicle. If ellipsometry can be used for the inspection of the PM with a pellicle in place, the cleaning frequency of the PM will be reduced significantly.
URI
http://iopscience.iop.org/article/10.1143/JJAP.47.6536/metahttp://repository.hanyang.ac.kr/handle/20.500.11754/80624
ISSN
0021-4922
DOI
10.1143/JJAP.47.6536
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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