Real-Time Observation of the Dry Oxidation of the Si(100) Surface with Ambient Pressure X-ray Photoelectron Spectroscopy
- Title
- Real-Time Observation of the Dry Oxidation of the Si(100) Surface with Ambient Pressure X-ray Photoelectron Spectroscopy
- Author
- 문봉진
- Keywords
- 2P CORE-LEVEL; THERMAL-OXIDATION; SYNCHROTRON-RADIATION; SI(001) SURFACES; SILICON; GROWTH; SI; OXIDE; DECOMPOSITION
- Issue Date
- 2008-03
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v. 92, No. 1, Article no. 012110
- Abstract
- We have applied ambient-pressure x-ray photoelectron spectroscopy with Si 2p chemical shifts to study the real-time dry oxidation of Si(100), using pressures in the range of 0.01-1 Torr and temperatures of 300-530 degrees C, and examining the oxide thickness range from 0 to similar to 25 angstrom. The oxidation rate is initially very high (with rates of up to similar to 225 angstrom/h) and then, after a certain initial thickness of the oxide in the range of 6-22 angstrom is formed, decreases to a slow state (with rates of similar to 1.5-4.0 angstrom/h). Neither the rapid nor the slow regime is explained by the standard Deal-Grove model for Si oxidation. (C) 2008 American Institute of Physics.
- URI
- https://aip.scitation.org/doi/full/10.1063/1.2830332https://repository.hanyang.ac.kr/handle/20.500.11754/80237
- ISSN
- 0003-6951
- DOI
- 10.1063/1.2830332
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > ETC
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