Highly conductive air-stable ZnO thin film formation under in situ UV illumination for an indium-free transparent electrode
- Title
- Highly conductive air-stable ZnO thin film formation under in situ UV illumination for an indium-free transparent electrode
- Author
- 성명모
- Keywords
- ZINC-OXIDE; DOPED ZNO; SOLAR-CELLS; TEMPERATURE; GROWTH; OXYGEN
- Issue Date
- 2016-07
- Publisher
- ROYAL SOC CHEMISTRY
- Citation
- RSC ADVANCES (2016), v. 6, NO. 73, Page. 69027-69032
- Abstract
- Zinc oxide (ZnO) is considered as the strongest alternative to tin doped indium oxide (ITO) - a commonly used, but an expensive state-of-the-art material for transparent conducting electrodes. This work reports the low temperature atomic layer deposition (ALD) of a highly transparent, and highly conductive air-stable thin film of ZnO under in situ UV irradiation of the growing film. X-ray photoelectron spectroscopy (XPS) reveals that the UV irradiation generates oxygen vacancies, partially removes O-H bonds, and thereby improves the electrical conductivity. Thus, in contrast to 0.25 U cm resistivity of the pristine ZnO film, the in situ UV irradiated ZnO film shows an electrical resistivity of 5.5 x 10(-4) U cm, and an optical transparency of nearly 90%, which are closer to that of ITO. In addition, even on prolonged exposure of the film to air, it demonstrates high stability against the degradation of the electrical conductivity.
- URI
- http://pubs.rsc.org/en/Content/ArticleLanding/2016/RA/C6RA13430K#!divAbstracthttps://repository.hanyang.ac.kr/handle/20.500.11754/74545
- ISSN
- 2046-2069
- DOI
- 10.1039/c6ra13430k
- Appears in Collections:
- COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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