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E-H mode transition in inductively coupled plasma using Ar, O-2, N-2, and mixture gas

Title
E-H mode transition in inductively coupled plasma using Ar, O-2, N-2, and mixture gas
Author
정진욱
Keywords
Inductively coupled plasma; E-H mode transition; Inductive mode; Capacitive mode; Electron energy distribution
Issue Date
2011-04
Publisher
ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
Citation
CURRENT APPLIED PHYSICS,권: 11 호: 5 페이지: S149-S153
Abstract
A study of the E-H mode transition was performed in Ar, O-2, N-2, and mixture gas inductively coupled plasma (ICP) from the measurement of the electron energy distribution function (EEDF). Changes of the EEDF and characteristics of the discharge on the E-H mode transition were discussed. At each E-mode, the measured EEDFs had different shapes depending on the gas type and pressure, while the EEDFs evolved into Maxwellian distribution with the E-H transition due to electron-electron collisions. This study was also focused on the transition ICP power when the discharge transits from E-mode to H-mode. As the ICP power increased in Ar discharge, the transition ICP power had minimum value at a particular pressure, while the transition ICP power was gradually increased with gas pressures in molecule gas discharge. The transition ICP power with gas mixing ratios was also studied in Ar/O-2/N-2 mixture gas discharge.
URI
https://www.sciencedirect.com/science/article/pii/S1567173911002203?via%3Dihubhttp://repository.hanyang.ac.kr/handle/20.500.11754/72800
ISSN
1567-1739; 1878-1675
DOI
10.1016/j.cap.2011.04.009
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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