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Silicon nanodisk array design for effective light trapping in ultrathin c-Si

Title
Silicon nanodisk array design for effective light trapping in ultrathin c-Si
Author
정두석
Keywords
SOLAR-CELLS; ABSORPTION ENHANCEMENT; PHOTOVOLTAICS; NANOSTRUCTURES; ANTIREFLECTION; EFFICIENCY
Issue Date
2014-10
Publisher
OPTICAL SOC AMER, 2010 MASSACHUSETTS AVE NW, WASHINGTON, DC 20036 USA
Citation
OPTICS EXPRESS, 22, 21, pp.A1431-A1439, 2014
Abstract
The use of ultrathin c-Si (crystalline silicon) wafers thinner than 20 mu m for solar cells is a very promising approach to realize dramatic reduction in cell cost. However, the ultrathin c-Si requires highly effective light trapping to compensate optical absorption reduction. Conventional texturing in micron scale is hardly applicable to the ultrathin c-Si wafers; thus, nano scale texturing is demanded. In general, nanotexturing is inevitably accompanied by surface area enlargements, which must be minimized in order to suppress surface recombination of minority carriers. In this study, we demonstrate using optical simulations that periodic c-Si nanodisk arrays of short heights less than 200 nm and optimal periods are very useful in terms of light trapping in the ultrathin c-Si wafers while low surface area enlargements are maintained. Double side texturing with the nanodisk arrays leads to over 90% of the Lambertian absorption limit while the surface area enlargement is kept below 1.5. (C) 2014 Optical Society of America
URI
https://www.osapublishing.org/oe/abstract.cfm?uri=oe-22-S6-A1431http://repository.hanyang.ac.kr/handle/20.500.11754/70302
ISSN
1094-4087
DOI
10.1364/OE.22.0A1431
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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