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dc.contributor.author박진구-
dc.date.accessioned2018-04-19T11:10:06Z-
dc.date.available2018-04-19T11:10:06Z-
dc.date.issued2013-01-
dc.identifier.citationSolid State Phenomena, 2013, 195, P.30-36en_US
dc.identifier.issn1012-0394-
dc.identifier.urihttps://www.scientific.net/SSP.195.30-
dc.identifier.urihttp://repository.hanyang.ac.kr/handle/20.500.11754/69751-
dc.description.abstractUltraviolet based nanoimprint lithography (UV-NIL) technology is widely used in nanosized fine pattern transfer. NIL, which uses low pressure and low temperature, makes it possible to fabricate 3-dimensional pattern [. So, UV-NIL is one of the techniques with great potential as a new manufacturing process. But, UV-NIL process uses an expensive quartz substrate for transmission of UV light. Therefore, quartz substrate needs to be recycled to reduce the manufacturing cost. Usually, UV-NIL uses UV curable resins, whose chemical bonding and structure could be altered during UV light exposure which would result in crosslinking between the polymers. This UV cured resin with cross-linked structure is very hard to remove from the quartz substrate [. Conventionally, UV cured resin is removed by treating with sulfuric acid-hydrogen peroxide mixture (SPM) followed by ammonium hydroxide-hydrogen peroxide mixture (APM). One of the major drawbacks in using SPM-based treatment is the chemical haze formation and particle contamination on the quartz substrate [. Thus, an alternative cleaning composition will be of interest.en_US
dc.language.isoenen_US
dc.publisherScitec Publications Ltden_US
dc.subjectDIO3 Cleaningen_US
dc.subjectMegasonicen_US
dc.subjectResin Removalen_US
dc.subjectTHFen_US
dc.subjectUV-NILen_US
dc.titleRemoval of UV cured resin using hybrid cleaning methoden_US
dc.typeArticleen_US
dc.relation.volume195-
dc.identifier.doi10.4028/www.scientific.net/SSP.195.30-
dc.relation.page30-33-
dc.relation.journalDiffusion and Defect Data Pt.B: Solid State Phenomena-
dc.contributor.googleauthorKim, M.S.-
dc.contributor.googleauthorKang, B.K.-
dc.contributor.googleauthorKim, J.K.-
dc.contributor.googleauthorLee, B.K.-
dc.contributor.googleauthorPark, J.G.-
dc.relation.code2013030831-
dc.sector.campusS-
dc.sector.daehakGRADUATE SCHOOL[S]-
dc.sector.departmentDEPARTMENT OF BIONANOTECHNOLOGY-
dc.identifier.pidjgpark-
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GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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