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Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Title
Mechanical stress induced by external forces in the extreme ultraviolet pellicle
Author
오혜근
Keywords
Deformation; EUV; Pellicle; Stress
Issue Date
2016-09
Publisher
SPIE
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v. 9985, Page. 1-8
Abstract
EUV pellicle with very thin thickness is significantly affected when external forces are applied. The mechanical forces such as chamber-pellicle pressure difference and stage acceleration cause the mechanical stress in pellicle. We investigated the maximum stress that can be induced by the pressure difference for various materials by using finite element method (FEM). We also used theoretical model and FEM for predicting the pellicle deformation. Our results show the mechanical deformation and the stress of full size (152 × 120 mm2) pellicle with 50 nm thickness, and the influence of the pellicle is increased with larger pressure difference. We also studied the maximum stress caused by the acceleration force of the scanner. The full size pellicle is greatly influenced with the specific pulse width causing resonance. Our study indicates that mechanical stress with acceleration is very small and can be ignored. © 2016 SPIE.
URI
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9985/99851K/Mechanical-stress-induced-by-external-forces-in-the-extreme-ultraviolet/10.1117/12.2242174.fullhttp://repository.hanyang.ac.kr/handle/20.500.11754/69309
ISSN
0277-786X
DOI
10.1117/12.2242174
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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