Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

Title
Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system
Author
오혜근
Keywords
extreme ultraviolet lithography; anamorphic numerical aperture; shadow effects
Issue Date
2016-08
Publisher
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Citation
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v. 15, No. 3, Article no. 033504
Abstract
A high numerical aperture (NA) system with an NA larger than 0.5 is required to make patterns of 1X nm and below, even though extreme ultraviolet lithography uses a 13.5-nm wavelength source. To avoid the reflective efficiency loss and to avoid an increase in the chief ray angle of incident light, use of an anamorphic high-NA system is suggested. The suggested anamorphic NA system has nonisotropic magnification, x-magnification of 4x and y-magnification of 8x, and the mask NA shape is an ellipse due to the nonisotropic magnification distribution. Anamorphic NA systems have a nonconventional shadow effect due to nonisotropic incident angle distribution and magnification. These nonisotropic characteristics lead to the reduction of asymmetric shadow distribution and a reduction of horizontal-vertical bias. As a result, anamorphic NA systems can achieve balanced patterning results regardless of pattern direction and incident direction. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
URI
https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-15/issue-3/033504/Anisotropic-shadow-effects-with-various-pattern-directions-in-an-anamorphic/10.1117/1.JMM.15.3.033504.full?SSO=1http://hdl.handle.net/20.500.11754/68055
ISSN
1932-5150; 1932-5134
DOI
10.1117/1.JMM.15.3.033504
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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