Effect of Nucleation Density on the Morphology of Diamond Thin Films
- Title
- Effect of Nucleation Density on the Morphology of Diamond Thin Films
- Author
- 이조원
- Keywords
- Chemical vapor deposition; Diamond; Microwave plasma; Nucleation density
- Issue Date
- 2012-07
- Publisher
- Japan SOC Applied Physics
- Citation
- Japanese Journal of Applied Physics 1, 1994, 33(11), P.6320-6324
- Abstract
- The morphology of diamond films deposited in the substrate temperature range of 550 degrees C to 750 degrees C by microwave plasma enhanced chemical vapor deposition (MPECVD) has been investigated as a function of the nucleation density. Nucleation density can be controlled in the range of 1.5 x 10(7) to 1.0 x 10(10) nuclei/cm(2) by varying the ultrasonic pretreatment time and the particle size of diamond powders. At high nucleation density, the thin films consist of well-faceted grains for all deposition times. Low nucleation density leads to cauliflower-like morphology for the initial deposition time, which develops into the well-faceted {100} grain with increasing deposition time. These results indicate that higher nucleation density reduces the time required to develop well-faceted diamond grains. Therefore, we can conclude that the final surface morphology of the diamond films is identical regardless of the nucleation density, after long growth time.
- URI
- http://iopscience.iop.org/article/10.1143/JJAP.33.6320/meta
- ISSN
- 0021-4922
- DOI
- 10.1143/JJAP.33.6320
- Appears in Collections:
- GRADUATE SCHOOL[S](대학원) > CONVERGENCE NANOSCIENCE(나노융합과학과) > Articles
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