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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 21-27 of 27 (Search time: 0.003 seconds).
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Issue Date
Title
Author(s)
1999-12
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
오혜근
1999-12
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
오혜근
2003-02
Prediction of the Critical Dimensions by Using a Threshold Energy Resist Model
오혜근
2004-06
The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method
오혜근
2003-11
Simulation Parameter Extraction Using Distribution Processing and Fast SEM Profile Digitization
오혜근
2002-11
Resolution Enhancement Method Using an Apodized Mask
오혜근
2002-04
Modification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the Development Parameter for a Chemically Amplified Resist SimulatorModification of the development parameter for a chemically amplified resist simulator
오혜근
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-Author
20
오혜근
6
정영대
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홍주유
-Subject
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Lithography simulation
5
Chemically amplified resist
4
Simulation
2
Analytical models
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Automotive materials
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CCSE
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Chemical analysis
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Chemical lasers
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Chemically-amplified resist
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Components, Circuits, Devices and...
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-Date issued
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2010 - 2015
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2000 - 2009
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1999 - 1999
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