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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 11-11 of 11 (Search time: 0.002 seconds).
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2008-11
A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
정영대
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-Author
8
오혜근
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정희준
1
정영대
-Subject
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double patterning
3
lithography simulation
2
alternating phase shift mask
2
bias
2
ellipsometry
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haze
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inverse lithography
2
numerical approach
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pellicle
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photomask
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-Date issued
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2008
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2007
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2006
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