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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 141-141 of 141 (Search time: 0.001 seconds).
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2000-02
Extraction of Exposure Parameters for 193 nm Chemically Amplified Resist and its Application to Simulation
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Lithography
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lithography
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ellipsometry
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Chemically amplified resist
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Lithography simulation
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Resist reflow process
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