| 2001-12 | Real-Time Spectroscopic Ellipsometric Studies of photo-Assisted Chemical Processes | 오혜근 |
| 2001-06 | Realization of speech recognition using DSP | 권영헌 |
| 2016-06 | Reduced distributions of the set current and the voltage of unipolar resistance switching in a current-biased set process | 강보수 |
| 2005-05 | Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography | 오혜근 |
| 2009-04 | Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography | 홍주유 |
| 2005-04 | Reduction of the Absorber Shadow Effect by Changing the Absorber Side Wall Angle in Extreme Ultraviolet Lithography | 오혜근 |
| 2006-02 | Reflow modeling for elongated contact hole shape | 오혜근 |
| 2006-02 | Reflow modeling for elongated contact hole shape | 홍주유 |
| 2018-06 | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | 오혜근 |
| 2014-10 | Renormalization plasma shielding effects on scattering entanglement fidelity in dense plasmas | 정영대 |
| 2014-07 | Renormalization screening and collision-induced quantum interference in dense plasmas | 정영대 |
| 2013-12 | Renormalization shielding and eikonal analysis on the atomic collision in dense partially ionized hydrogen plasmas | 정영대 |
| 2016-01 | Renormalization shielding effect on the Wannier-ridge mode for double-electron continua in partially ionized dense hydrogen plasmas | 정영대 |
| 2013-02 | Renormalized dynamic charge shielding on the electron-atom collision: Eikonal analysis | 정영대 |
| 2002-03 | Resist Develop Prediction by Monte Carlo Simulation | 오혜근 |
| 2002-12 | Resist distribution effect of spin coating | 오혜근 |
| 2002-03 | Resist Distribution Effect of Spin Coating | 오혜근 |
| 2003-02 | Resist Pattern Collapse Modeling for Smaller Features | 오혜근 |
| 2002-11 | Resist pattern collapse with top rounding resist profile | 오혜근 |
| 2003-06 | Resist Pattern Collapse with Top Rounding Resist Profile | 오혜근 |
