| 2015-03 | Gap solitons in photorefractive medium with PT-symmetric optical lattices | 정영대 |
| 2002-07 | Generalized Quantum Search Hamiltonian | 권영헌 |
| 2020-05 | Generalized sequential state discrimination for multiparty QKD and its optical implementation | 권영헌 |
| 2020-12 | Generalized sequential state discrimination for multiparty QKD and its optical implementation | 권영헌 |
| 2007-05 | Growth behaviour of ZnO thin films and nanowires on SrTiO3 substrates | 정희준 |
| 2008-11 | Haze defects due to pellicle adhesive | 오혜근 |
| 2009-11 | Heat conduction from hot plate to photoresist on top of wafer including heat loss to the environment | 오혜근 |
| 2008-11 | Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach | 오혜근 |
| 2008-11 | Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application | 오혜근 |
| 2024-01-04 | Heterogeneous popularity of metabolic reactions from evolution | 이미진 |
| 2008-08 | High-current-density CuOx/InZnOx thin-film diode for cross-point memory applications | 강보수 |
| 2020-04 | Highly stable, solution-processed quaternary oxide thin film-based resistive switching random access memory devices via global and local stoichiometric manipulation strategy | 강보수 |
| 2002-09 | Hydrogen-induced degradation in ferroelectric Bi3.25La0.75Ti3O12 | 강보수 |
| 2002-11 | Hydrogen-induced degradation mechanisms in ferroelectric (Bi,La)4Ti3O12 and Pb(Zr,Ti)O3 thin films | 강보수 |
| 2000-12 | Hydrogenation of ZnO:Al Thin Films Using Hot Filament | 김옥경 |
| 1999-08 | Image Charge Effects on Bremsstrahlung Radiation from Electron-Dust Grain Scattering in Dusty Plasmas | 정영대 |
| 2001-07 | Image charge effects on electron capture by dust grains in dusty plasmas | 정영대 |
| 2017-03 | Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography | 오혜근 |
| 2009-04 | Impact of Polarization Inside a Resist for ArF Immersion Lithography | 정영대 |
| 2009-08 | Impact of the Parameters for a Chemically-amplified Resist on the Line-edge-roughness by Using a Molecular-scale Lithography Simulation | 정영대 |
