| 2009-11 | 1/f Noise analysis of songs in various genre of music | 권영헌 |
| 2015-07 | 1/f Noise Scaling Analysis in Unipolar-Type Organic Nanocomposite Resistive Memory | 정희준 |
| 2001-02 | 193nm 화학 증폭형 감광제 시뮬레이션을 위한 노광후 지연 효과에 대한 연구 | 오혜근 |
| 2001-02 | 193nm용 화학 증폭형 감광제의 노광 후 열처리 과정중 두께 변화에 관한 연구 | 오혜근 |
| 2008-11 | 22 nm 1:1 line and space patterning by using double patterning and resist reflow process | 오혜근 |
| 2008-02 | 22 nm node contact hole formation in extreme ultra-violet lithography | 오혜근 |
| 2008-02 | 32 nm 1:1 line and space patterning by resist reflow process | 오혜근 |
| 2008-01 | 32 nm 1:1 Line and Space Patterning by Resist Reflow Process | 오혜근 |
| 2008-03 | 32 nm 1:1 line and space patterning by resist reflow process | 정희준 |
| 2007-02 | 32 nm pattern collapse modeling with radial distance and rinse speed | 오혜근 |
| 2007-08 | 32nm Pattern Collapse Modeling with Radial Distance and Rinse Speed | 오혜근 |
| 2008-11 | A Mask Generation Approach to Double Patterning Technology with Inverse Lithography | 정영대 |
| 2018-09 | A minimal set of measurements for qudit-state tomography based on unambiguous discrimination | 권영헌 |
| 2010-05 | A study of virtual lithography process for polymer directed self-assembly | 정영대 |
| 2007-01 | Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature | 오혜근 |
| 2008-11 | Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask | 오혜근 |
| 2007-09 | Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask | 오혜근 |
| 2006-12 | Adaptive Noise Estimation Using Least-Squares Line in Wavelet Packet Transform Domain | 권영헌 |
| 2003-12 | Adaptive Wavelet based Speech Enhancement with Robust VAD in Non-Stationary Noise Environment | 권영헌 |
| 2002-12 | Adaptive Wavelet Denoising For Speech Rocognition in Car Interior Noise | 권영헌 |
