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Showing results 1 to 20 of 91

Issue DateTitleAuthor(s)
2008-1122 nm 1:1 line and space patterning by using double patterning and resist reflow process오혜근
2008-0222 nm node contact hole formation in extreme ultra-violet lithography오혜근
2008-0232 nm 1:1 line and space patterning by resist reflow process오혜근
2008-0132 nm 1:1 Line and Space Patterning by Resist Reflow Process오혜근
2008-0332 nm 1:1 line and space patterning by resist reflow process정희준
2008-11Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask오혜근
2008-06Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)오혜근
2018-04Analysis of Optimal Sequential State Discrimination for Linearly Independent Pure Quantum States권영헌
2015-06Analysis of optimal unambiguous discrimination of three pure quantum states권영헌
2017-01Analytical model of variable characteristic of coefficient of restitution and its application to ball trajectory planning권영헌
2008-06Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes홍주유
2008-06Anisotropic resist reflow process simulation for 22 nm elongated contact holes오혜근
2016-08Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system오혜근
2017-03Arc-shaped slit effect of EUV lithography with anamorphic high NA system in terms of critical dimension variation오혜근
2017-03CD Error Caused by Aberration and Its Possible Compensation by Optical Proximity Correction in Extreme-Ultraviolet Lithography오혜근
2008-03Characteristics of Negative Electron Beam Resists, ma-N2410 and ma-N2405정희준
2008-01Comparative structural and electrical analysis of NiO and Ti doped NiO as materials for resistance random access memory강보수
2008-02Critical dimension control for 32 nm node random contact hole array using resist reflow process홍주유
2008-02Critical dimension control for 32 nm node random contact hole array using resist reflow process오혜근
2017-09Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node오혜근

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