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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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2021-12
Microstructures of Hfox films prepared via atomic layer deposition using Ua(NO3)3·6H2O oxidants
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2021-11
Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors
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2021-03
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
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2021-07
A new route of synthesizing atomically thin 2D materials embedded in bulk oxides
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atomic layer deposition
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3CDS
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ALD
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hafnium oxide film
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hollow cathode plasma
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MOSFET
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PEALD
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plasma-enhanced ALD
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silicon nitride
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trichlorodisilane
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