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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 1-10 of 15 (Search time: 0.001 seconds).
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Issue Date
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Author(s)
2022-03
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
안진호
2022-01
Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle
안진호
2022-01
Highly Reliable Selection Behavior with Controlled Ag Doping of Nano-polycrystalline ZnO Layer for 3D X-Point Framework
안진호
2021-12
Microstructures of Hfox films prepared via atomic layer deposition using Ua(NO3)3·6H2O oxidants
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2021-11
Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors
안진호
2022-04
Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
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2022-07
Atomic layer etching of SiO2 using trifluoroiodomethane
안진호
2021-03
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
안진호
2021-07
A new route of synthesizing atomically thin 2D materials embedded in bulk oxides
안진호
2020-08
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
안진호
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atomic layer deposition
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1S1R
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1T-DRAM
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3CDS
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3D X-Point
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5O(2)
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5Zr(0)
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ALD
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aluminum nitride
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atomic layer deposition (ALD)
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2020
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