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Issue DateTitleAuthor(s)
2015-03Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)(2) and oxygen remote plasma전형탁
2015-01Effect of a Ti capping layer on thermal stability of NiSi formed from Ni thin films deposited by metal organic chemical vapor deposition using a Ni(Pr-i-DAD)(2) precursor전형탁
2015-03Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( (i) Pr-DAD)(2)전형탁
2015-03Endurance improvement due to rapid thermal annealing (RTA) of a TaO (x) thin film in an oxygen ambient전형탁
2011-07The Effect of Annealing Ambient on the Characteristics of an Indium-Gallium-Zinc Oxide Thin Film Transistor전형탁
2012-12Synergistic Interaction between Substrate and Seed Particles in Ultrathin Ultrananocrystalline Diamond Film Nucleation on SiO2 with Controlled Surface Termination전형탁
2016-06Tunnelling current-voltage characteristics of Angstrom gaps measured with terahertz time-domain spectroscopy전형탁
2011-07Luminescent mechanism of Eu3+-doped epitaxial Gd2O3 films grown on a Si (111) substrate using an effusion cell전형탁
2011-07Microstructural characterization at the interface of Al2O3/ZnO/Al2O3 thin films grown by atomic layer deposition전형탁
2011-01Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column전형탁

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