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dc.contributor.author안희준-
dc.date.accessioned2018-03-23T04:20:01Z-
dc.date.available2018-03-23T04:20:01Z-
dc.date.issued2013-09-
dc.identifier.citationNature nanotechnology, 2013, 8(9), p.667-675en_US
dc.identifier.issn1748-3387-
dc.identifier.urihttps://www.nature.com/articles/nnano.2013.160-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/51158-
dc.description.abstractSelf-assembly of block-copolymers provides a route to the fabrication of small (size, <50 nm) and dense (pitch, <100 nm) features with an accuracy that approaches even the demanding specifications for nanomanufacturing set by the semiconductor industry. A key requirement for practical applications, however, is a rapid, high-resolution method for patterning block-copolymers with different molecular weights and compositions across a wafer surface, with complex geometries and diverse feature sizes. Here we demonstrate that an ultrahigh-resolution jet printing technique that exploits electrohydrodynamic effects can pattern large areas with block-copolymers based on poly(styrene-block-methyl methacrylate) with various molecular weights and compositions. The printed geometries have diameters and linewidths in the sub-500 nm range, line edge roughness as small as ∼45 nm, and thickness uniformity and repeatability that can approach molecular length scales (∼2 nm). Upon thermal annealing on bare, or chemically or topographically structured substrates, such printed patterns yield nanodomains of block-copolymers with well-defined sizes, periodicities and morphologies, in overall layouts that span dimensions from the scale of nanometres (with sizes continuously tunable between 13 nm and 20 nm) to centimetres. As well as its engineering relevance, this methodology enables systematic studies of unusual behaviours of block-copolymers in geometrically confined films.en_US
dc.description.sponsorshipThis work was supported by the Center for Nanoscale Chemical Electrical Mechanical Manufacturing Systems at the University of Illinois (funded by the National Science Foundation under grant CMMI-0749028). The authors acknowledge R. Gronheid and P. Rincon Delgadillo for providing the chemically patterned substrates. C.S. and H.A. were partially supported by the Basic Science Research Program through the National Research Foundation of Korea funded by the Ministry of Education, Science and Technology (2012R1A6A1029029). The authors thank S. Maclaren and K. Chow for support with AFM and electron-beam lithography, respectively. AFM and SEM studies were carried out in the Frederick Seitz Materials Research Laboratory Central Facilities, University of Illinois.en_US
dc.language.isoenen_US
dc.publisherNature Publishing Groupen_US
dc.subjectTHIN-FILMSen_US
dc.subjectDIBLOCK COPOLYMERSen_US
dc.subjectNANOSCALE PATTERNSen_US
dc.subjectTEMPLATESen_US
dc.subjectBLENDSen_US
dc.subjectARRAYSen_US
dc.subjectNANOLITHOGRAPHYen_US
dc.subjectNANOSTRUCTURESen_US
dc.subjectGRAPHOEPITAXYen_US
dc.subjectLITHOGRAPHYen_US
dc.titleHierarchical patterns of three-dimensional block-copolymer films formed by electrohydrodynamic jet printing and self-assemblyen_US
dc.typeArticleen_US
dc.relation.no9-
dc.relation.volume8-
dc.identifier.doi10.1038/nnano.2013.160-
dc.relation.page667-675-
dc.relation.journalNATURE NANOTECHNOLOGY-
dc.contributor.googleauthorOnses, M Serdar-
dc.contributor.googleauthorSong, Chi-ho-
dc.contributor.googleauthorWilliamson, Lance-
dc.contributor.googleauthorSutanto, Erick-
dc.contributor.googleauthorFerreira, Placid M-
dc.contributor.googleauthorAlleyne, Andrew G-
dc.contributor.googleauthorNealey, Paul F-
dc.contributor.googleauthorRogers, John A-
dc.contributor.googleauthorAhn, Hee-joon-
dc.relation.code2013011403-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ORGANIC AND NANO ENGINEERING-
dc.identifier.pidahn-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ORGANIC AND NANO ENGINEERING(유기나노공학과) > Articles
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