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Depth resolved band alignments of ultrathin TiN/ZrO2 and TiN/ZrO2-Al2O3-ZrO2 dynamic random access memory capacitors

Title
Depth resolved band alignments of ultrathin TiN/ZrO2 and TiN/ZrO2-Al2O3-ZrO2 dynamic random access memory capacitors
Other Titles
ZrO2 and TiN
Author
전형탁
Keywords
TiN/ZrO2; TiN/ZrO2-Al2O3-ZrO2; CBO
Issue Date
2014-11
Publisher
AMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Citation
APPLIED PHYSICS LETTERS, 권: 150, 호: 20
Abstract
In this paper, we investigated the interface band alignment of TiN/ZrO2 and TiN/ZrO2-Al2O3-ZrO2 (TiN/ZAZ) structures by analyzing the conduction band offset (CBO) and valence band offset at the electrode/dielectric interface using depth-resolved spectroscopy techniques. At the center of the interface, which is defined by the chemical composition depth profile, CBO values of 2.03 eV and 2.57 eV for ZrO2 and ZAZ were found, respectively. Subcutaneous TiON, which is induced by the process, was identified at this interface, and it played an important role in creating sub-band states. Based on combined analyses on both intrinsic and sub-band structures, a band alignment model is proposed. It was confirmed that the Al2O3 layer in ZAZ leads to a lowering of the Fermi energy or a p-doping effect, thereby increasing both the CBO and the tunneling barrier height in metal-insulator-metal capacitors. (C) 2014 AIP Publishing LLC.
URI
https://aip.scitation.org/doi/abs/10.1063/1.4902244http://hdl.handle.net/20.500.11754/49095
ISSN
0003-6951; 1077-3118
DOI
10.1063/1.4902244
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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