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Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

Title
Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
Author
전형탁
Keywords
GAS-DIFFUSION BARRIERS; LIGHT-EMITTING-DIODES; POLYMERS; FILMS
Issue Date
2014-02
Publisher
AMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Citation
JOURNAL OF APPLIED PHYSICS; FEB 21 2014, 115, 7, 7p
Abstract
Al2O3 films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al2O3 layers with different densities are deposited with different deposition conditions of O-2 plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 x 10(-5) gm(-2) day(-1), which is one order of magnitude less than WVTR for the reference single-density Al2O3 layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O-2 and H2O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic
URI
https://aip.scitation.org/doi/abs/10.1063/1.4866001http://hdl.handle.net/20.500.11754/48051
ISSN
0021-8979
DOI
10.1063/1.4866001
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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