36 0

Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers

Title
Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers
Author
박진구
Keywords
thin films; vapor deposition; surface; atomic force microscopy (AFM); self assembled monolayer
Issue Date
2013-04
Publisher
KOREAN INST METALS MATERIALS, POSCO CENTER, 4TH FL (EAST WING), 892 DAECHI-4-DONG, KANGNAM-KU, SEOUL 135-777, SOUTH KOREA
Citation
KOREAN JOURNAL OF METALS AND MATERIALS 권: 51 호: 4 페이지: 259-264
Abstract
The optimum conditions for FOTS films deposited as vapor self-assembled monolayers for producing a hydrophobic film with low roughness was determined to be 10 Torr and 50 degrees C. The root mean square (RMS) of film roughness was 0.72 nm and its contact angle 108.14 degrees. These conditions are much simpler than the conventional process in which high temperature is known to result in high contact angles and reduced agglomeration of precursor molecules and roughness. However, we found that optimized hydrophobic FOTS film that provides an anti-stiction layer in micro-electro-mechanical systems can be obtained at low temperature and high pressure with a comparable contact angle to and lower roughness than the film obtained using the conventional process.
URI
http://210.101.116.102/journal_korea/detail_01.asp?a_key=3129872#
ISSN
1738-8228
DOI
10.3365/KJMM.2013.51.4.259
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE