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Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based Slurry

Title
Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based Slurry
Author
박재근
Keywords
SODIUM PERIODATE; COPPER; CMP; SPECTROSCOPY; PERFORMANCE; REMOVAL; ENERGY; RUCMP; PH
Issue Date
2013-01
Publisher
Electrochemical SOC INC
Citation
ECS Journal of Solid State Science and Technology, 2013, 2(1), P.26-P30
Abstract
We investigated effect of oxidizers on chemical mechanical planarization (CMP) of ruthenium (Ru). Several commonly used oxidizers with different standard reduction potentials were used in the Ru CMPtest, and their corrosion behaviors and states of surface oxidation were analyzed. We found that Ru only had a high polishing rate with slurries containing sodium periodate and sodium hypochlorite. We also observed that Ru film underwent severe pitting corrosion with these slurries, and formed a porous RuO3/RuO2 oxide layer. Ru film was unable to achieve high corrosion current density as well as form a porous RuO3/RuO2 oxide layer except for these two oxidizers. Both the corrosion and oxidation (formation of RuO3/RuO2 layer) processes influenced the Ru polishing rate, but the oxidation process was assumed to play a more decisive role in the Ru CMP. The mechanism for the types of oxidizers in Ru corrosion and oxidation processes is discussed and explained through a diagram of the equilibrium electronic band of Ru metal electrodes and oxidizers in an aqueous solution. (C) 2012 The Electrochemical Society. All rights reserved.
URI
http://jss.ecsdl.org/content/2/1/P26http://hdl.handle.net/20.500.11754/41462
ISSN
2162-8769
DOI
10.1149/2.030301jss
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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