Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진성 | - |
dc.date.accessioned | 2018-02-22T09:36:39Z | - |
dc.date.available | 2018-02-22T09:36:39Z | - |
dc.date.issued | 2011-10 | - |
dc.identifier.citation | APPLIED PHYSICS LETTERS, 권: 99, 호: 14 | en_US |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://aip.scitation.org/doi/10.1063/1.3646105 | - |
dc.description.abstract | RF-sputtered TiOx layers were thermally treated and the associated thin-film transistor properties were studied. X-ray diffraction and x-ray absorption spectroscopy analyses indicate that as-grown amorphous TiOx films crystallize to anatase at temperatures above 450 degrees C in air. Thin-film transistors incorporating anatase active layers exhibit n-type behavior, with field effect mobility values near 0.11 cm(2)/Vs when annealed at 550 degrees C. Such a phenomenon is suggested to originate from the ordering of Ti 3d orbitals upon crystallization, and the mobility enhancement at higher annealing temperatures may be attributed to the reduced grain boundary scattering of carriers by virtue of enlarged average grain size. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3646105] | en_US |
dc.description.sponsorship | Dr. Jin-Seong Park acknowledges financial support from the LCD division of Samsung Electronics, Inc., and the partial support from the Basic Science Research Program through the National Research Foundation (NRF), which is funded by the Korean Ministry of Education, Science and Technology (Grant Nos. 2011-0004433 and 2011-0004901). | en_US |
dc.language.iso | en | en_US |
dc.publisher | AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA | en_US |
dc.subject | annealing | en_US |
dc.subject | crystallisation | en_US |
dc.subject | grain boundaries | en_US |
dc.subject | grain size | en_US |
dc.subject | molecular electronic states | en_US |
dc.subject | semiconductor growth | en_US |
dc.subject | semiconductor materials | en_US |
dc.subject | semiconductor thin films | en_US |
dc.subject | sputter deposition | en_US |
dc.subject | thin film transistors | en_US |
dc.subject | titanium compounds | en_US |
dc.subject | X-ray absorption spectra | en_US |
dc.subject | X-ray diffraction | en_US |
dc.title | Molecular orbital ordering in titania and the associated semiconducting behavior | en_US |
dc.type | Article | en_US |
dc.relation.no | 14 | - |
dc.relation.volume | 99 | - |
dc.identifier.doi | 10.1063/1.3646105 | - |
dc.relation.page | 1-1 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.contributor.googleauthor | Park, Joseph | - |
dc.contributor.googleauthor | Ok, Kyung-Chul | - |
dc.contributor.googleauthor | Ahn, Byung Du | - |
dc.contributor.googleauthor | Lee, Je Hun | - |
dc.contributor.googleauthor | Park, Jae-Woo | - |
dc.contributor.googleauthor | Chung, Kwun-Bum | - |
dc.contributor.googleauthor | Park, Jin-Seong | - |
dc.relation.code | 2011200866 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | jsparklime | - |
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