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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
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Results 1-4 of 4 (Search time: 0.001 seconds).
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2006-11
Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
안일신
2008-09
Optimum Biasing for 45nm Node Chromeless and Attenuated Phase Shift Mask
안일신
2008-09
Optimum biasing for 45 nm node chromeless and attenuated phase shift mask
신동수
2006-11
Investigation of optimum biasing and undercut for single trench alternating phase shift mask in 193 nm lithography
신동수
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신동수
2
안일신
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45nm line and space
2
alternating phase shift mask
2
attenuated phase shift mask (att....
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chromeless phase lithography (CPL...
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lithography
2
optical proximity correction (OPC)
2
pitch
2
undercut
-Date issued
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2008
2
2006
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