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Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition

Title
Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
Author
전형탁
Keywords
NISI FILMS; ELECTRICAL CHARACTERIZATION; THIN-FILMS; MONOSILICIDE; NUCLEATION; SUBSTRATE; SYSTEMS; PHASE; NI/SI
Issue Date
2016-03
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v. 34, NO 3, Article number 031502, Page. 502-502
Abstract
In this study, the effects of a thin Ru interlayer on the thermal and morphological stability of NiSi have been investigated. Ru and Ni thin films were deposited sequentially to form a Ni/Ru/Si bilayered structure, without breaking the vacuum, by remote plasma atomic layer deposition (RPALD) on a p-type Si wafer. After annealing at various temperatures, the thermal stabilities of the Ni/Ru/Si and Ni/Si structures were investigated by various analysis techniques. The results showed that the sheet resistance of the Ni/Ru/Si sample was consistently lower compared to the Ni/Si sample over the entire temperature range. Although both samples exhibited the formation of NiSi2 phases at an annealing temperature of 800 degrees C, as seen with glancing angle x-ray diffraction, the peaks of the Ni/Ru/Si sample were observed to have much weaker intensities than those obtained for the Ni/Si sample. Moreover, the NiSi film with a Ru interlayer exhibited a better interface and improved surface morphologies compared to the NiSi film without a Ru interlayer. These results show that the phase transformation of NiSi to NiSi(2)was retarded and that the smooth NiSi/Si interface was retained due to the activation energy increment for NiSi(2)nucleation that is caused by adding a Ru interlayer. Hence, it can be said that the Ru interlayer deposited by RPALD can be used to control the phase transformation and physical properties of nickel silicide phases. (C) 2016 American Vacuum Society.
URI
http://avs.scitation.org/doi/10.1116/1.4943090http://hdl.handle.net/20.500.11754/35420
ISSN
0734-2101; 1520-8559
DOI
10.1116/1.4943090
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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