44 0

Random yield loss during wafer cleaning

Title
Random yield loss during wafer cleaning
Author
박진구
Issue Date
2011-04
Publisher
PENNWELL PUBL CO
Citation
SOLID STATE TECHNOLOGY, v. 54, NO 4, Page. 16-16
Abstract
The cleaning process performance in both conventional wet-bath and a single-wafer processor was evaluated. Experiments performed in this study were primarily oriented toward the determination of the number of particles added onto the wafer by using various pumping methods. In particular, the impact of pump-induced particles on silicon wafer cleaning in DI water was investigated. The random yield of ICs was estimated from the particle count data using various correlations including a negative binomial model.저자 정보
URI
http://search.proquest.com/docview/861490347?accountid=11283http://hdl.handle.net/20.500.11754/35164
ISSN
0038-111X
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE