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First-principles calculations of the structure and growth mechanism of allyl mercaptan lines on the H/Si(100)-2x1 surface

Title
First-principles calculations of the structure and growth mechanism of allyl mercaptan lines on the H/Si(100)-2x1 surface
Author
조준형
Keywords
SELF-DIRECTED GROWTH; SCANNING TUNNELING MICROSCOPE; RADICAL-CHAIN-REACTION; SI(100)-(2X1)-H SURFACE; MOLECULAR LINES; NANOSTRUCTURES; SILICON; PSEUDOPOTENTIALS; SITE
Issue Date
2011-02
Publisher
AMER PHYSICAL SOC, ONE PHYSICS ELLIPSE, COLLEGE PK, MD 20740-3844 USA
Citation
PHYSICAL REVIEW B, v. 83, NO 3, Page. 033406-033406
Abstract
Using first-principles density-functional calculations, we investigate the structure and growth mechanism of allyl mercaptan lines on the H-terminated Si(100)-2x1 surface. The earlier structural model (termed the linear structure), where the terminal C atom of the C=C bond initially reacts with a single Si dangling bond, has been competing with a new structural model (termed the branched structure) where the medial C atom of the C=C bond initially reacts with a single Si dangling bond. We find that formation of the branched structure is kinetically unfavored over that of the linear structure. Moreover, the simulated scanning tunneling microscopy (STM) image of the branched structure cannot reproduce the features observed in the STM experiment, such as the position and origin of the bright protrusion. Thus, the present results do not support the branched structure in many respects.
URI
http://journals.aps.org/prb/abstract/10.1103/PhysRevB.83.033406http://hdl.handle.net/20.500.11754/35078
ISSN
2469-9950
DOI
10.1103/PhysRevB.83.033406
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > PHYSICS(물리학과) > Articles
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