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Showing results 381 to 400 of 833

Issue DateTitleAuthor(s)
2020-08The Caracteristic of Copper oxide film H2S gas sensor by controlling nano porous structure using Gas Flow Sputtering이원지
2017-02The characteristic of WNxCy films deposited by remote plasma atomic layer deposition for metal gate김만석
2020-02The degradation and recovery mechanism analysis of the electrical performance in flexible a-IGZO TFT under various rolling stress with TCAD simulation김범수
2009-08The early stage of deposition process at surface and interface for magnetic multilayer systems: molecular dynamics simulation이순근
2023The effect of anisotropic microstructure on hydrogen embrittlement of additively manufactured AISI 316L stainless steel이정준
2015-08The Effect of Cation/Anion Addition on the electrical performance of Zinc Tin Oxide thin film transistor by solution-processing.전혜지
2021The effect of magnetocrystalline anisotropy on the magnetocaloric properties of MnFe-based alloys이아영
2022The effects of 600℃ annealing and tensile plastic deformation on mechanical properties of Cu62Zn38 and (Cu62Zn38)97.5Al2.5 shape memory alloys이량
2012-02THE EFFECTS OF HfO2 BUFFER LAYER ON Al2O3-PASSIVATED INDIUM-GALLIUM-ZINC OXIDE THIN FILM TRANSISTORS고영빈
2021The Effects of Precursor and Capping Metals On the Effective Work-Function of ALD TaN in HfO2-based MOS Device김민혁
2015-02The Effects of Zn Precursor on Chemical Bath Deposited ZnS​​(O홍지연
2022The Formation of Dipole to Modulate Flatband Voltage (VFB) using ALD Al2O3 and La2O3 on the HfO2-based Si and Ge MOS Devices장원국
2015-02The post annealing effect on resistive switching of TaOx thin film홍정협
2009-08THE PREPARATION OF TITANIA AND QUANTUM DOT NANOPARTICLES AND THEIR APPLICATIONS TO THE PHOTOVOLTAIC CELLS백인찬
2022The Study of ALD Hydrogen Barrier for All ALD Unified IGZO Thin film Transistors by Structural Modulation김경록
2020-02The Study of EUV Ptychography Microscope for Optical Investigation of EUV Materials우동곤
2016-02THE STUDY OF MOISTURE PERMEATION BARRIER CHARACTERISTICS OF Al2O3 THIN FILM DEPOSITED BY SPATIAL ATOMIC LAYER DEPOSITION최학영
2017-02The study of photon shot noise effect in EUVL by using attenuated PSM홍성철
2019-02The study on the characteristics of low temperature silicon nitride thin film for gate spacer using remote plasma atomic layer depositionWoochool Jang
2008-02Theoretical investigation of optical characteristics in the Mo/Si multilayer system for extreme ultraviolet lithography (EUVL)강인용

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