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Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition

Title
Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
Author
장재영
Keywords
GAS-DIFFUSION BARRIERS; ALUMINUM-OXIDE; MULTILAYER PASSIVATION; WATER-VAPOR; DEVICES; PERFORMANCE; TRANSISTORS; TECHNOLOGY; CRYSTALLIZATION; INTERLAYER
Issue Date
2016-01
Publisher
ROYAL SOC CHEMISTRY
Citation
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, v. 18, NO 2, Page. 1042-1049
Abstract
Encapsulation is essential for protecting the air-sensitive components of organic light-emitting diodes (OLEDs), such as the active layers and cathode electrodes. Thin film encapsulation approaches based on an oxide layer are suitable for flexible electronics, including OLEDs, because they provide mechanical flexibility, the layers are thin, and they are easy to prepare. This study examined the effects of the oxide ratio on the water permeation barrier properties of Al2O3/TiO2 nanolaminate films prepared by plasma-enhanced atomic layer deposition. We found that the Al2O3/TiO2 nanolaminate film exhibited optimal properties for a 1 : 1 atomic ratio of Al2O3/TiO2 with the lowest water vapor transmission rate of 9.16 x 10(-5) g m(-2) day(-1) at 60 degrees C and 90% RH. OLED devices that incorporated Al2O3/TiO2 nanolaminate films prepared with a 1 : 1 atomic ratio showed the longest shelf-life, in excess of 2000 hours under 60 degrees C and 90% RH conditions, without forming dark spots or displaying edge shrinkage.
URI
http://pubs.rsc.org/en/Content/ArticleLanding/2016/CP/C5CP06713H#!divAbstracthttp://hdl.handle.net/20.500.11754/30543
ISSN
1463-9076; 1463-9084
DOI
10.1039/c5cp06713h
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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