Antireflective conducting nanostructures with an atomic layer deposited an AlZnO layer on a transparent substrate
- Title
- Antireflective conducting nanostructures with an atomic layer deposited an AlZnO layer on a transparent substrate
- Author
- 박진성
- Keywords
- Anti-reflection coating; Transparent conducting oxide; Al doped ZnO; Atomic layer deposition
- Issue Date
- 2015-12
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- APPLIED SURFACE SCIENCE, v. 357, Page. 2385-2390
- Abstract
- The antireflective conducting nanostructures on a transparent substrate were shown to have enhanced optical and electrical properties via colloidal lithography and atomic layer deposition. The conformal AlZnO layer on a transparent nanostructured substrate exhibited 5.52 x 10(-4) Omega cm in resistivity and 88% in average visible transmittance, both of which were superior to those of a flat transparent conducting substrate. The improvement of transparency was explained by the gradual changes of the refractive index in the film depth direction. The decrease in electrical resistivity is strongly correlated to the increased surface area with the nanostructure and the change of chemical bonding states. (C) 2015 Elsevier B.V. All rights reserved.
- URI
- http://www.sciencedirect.com/science/article/pii/S0169433215023879?via%3Dihubhttp://hdl.handle.net/20.500.11754/30269
- ISSN
- 0169-4332; 1873-5584
- DOI
- 10.1016/j.apsusc.2015.09.256
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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