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포토마스크 펠리클 제조를 위한 Aluminum Frame 표면 세정공정 연구

Title
포토마스크 펠리클 제조를 위한 Aluminum Frame 표면 세정공정 연구
Other Titles
Study on Aluminum Frame Surface Cleaning Process for Photomask Pellicle Fabrication
Author
박진구
Keywords
lithography; photomask; pellicle; aluminum alloys; SMUT; ultrasonic cleaning
Issue Date
2015-09
Publisher
한국재료학회
Citation
한국재료학회지, v. 25, NO 9, Page. 462-467
Abstract
Pellicle is defined as a thin transparent film stretched over an aluminum (Al) frame that is glued on one side of a photomask. As semiconductor devices are pursuing higher levels of integration and higher resolution patterns, the cleaning of the Al flame surface is becoming a critical step because the contaminants on the Al flame can cause lithography exposure defects on the wafers. In order to remove these contaminants from the Al frame, a highly concentrated nitric acid (HNO3) solution is used. However, it is difficult to fully remove them, which results in an increase in the Al surface roughness. In this paper, the pellicle frame cleaning is investigated using various cleaning solutions. When the mixture of sulfuric acid (H2SO4), hydrofluoric acid (HF), hydrogen peroxide (H2O2), and deionized water with ultrasonic is used, a high cleaning efficiency is achieved without HNO3. Thus, this cleaning process is suitable for Al frame cleaning and it can also reduce the use of chemicals.
URI
http://journal.mrs-k.or.kr/journal/article.php?code=34648http://hdl.handle.net/20.500.11754/27696
ISSN
1225-0562; 2287-7258
DOI
10.3740/MRSK.2015.25.9.462
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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