Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting

Title
Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting
Authors
정진욱
Keywords
Nanoparticles; Copper; Plasma; Plasma-Induced Dewetting
Issue Date
2015-03
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 15, NO 3, Page. 2542-2546
Abstract
The effects of plasma parameters such as plasma density, electron temperature, and sheath voltage on the uniformity of Cu nanoparticle arrays were investigated. These parameters were controlled by varying the pressure, RF power, and substrate bias voltage. A floating harmonic method was used to monitor the plasma parameters. Uniform nanoparticle arrays were produced when hole generation was increased by using a high ion bombardment energy. As oppose to a low energy flux condition, where small and large nanoparticles coexisted due to a small number of holes, a larger number of holes was generated and distributed more uniformly during a high energy flux condition.
URI
http://www.ingentaconnect.com/content/asp/jnn/2015/00000015/00000003/art00099http://hdl.handle.net/20.500.11754/23319
ISSN
1533-4880; 1533-4899
DOI
http://dx.doi.org/10.1166/jnn.2015.10237
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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