Enhanced Acid Diffusion Control by Using Photoacid Generator Bound Polymer Resist

Title
Enhanced Acid Diffusion Control by Using Photoacid Generator Bound Polymer Resist
Authors
이해원
Keywords
Polymer Bound PAG Resist; Photoacid Generator; ArF Lithography; Negative Type Photoresist
Issue Date
2015-02
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 15, NO 2, Page. 1764-1766
Abstract
Photoacid generators (PAGs) have been widely used as a key component for improving photoresist performance. The acid diffusion influences on the photoresist characteristics of resolution and line edge roughness (LER). The PAG bound polymer resist has been a key component for solving the problems of PAG aggregation and acid diffusion control. A triphenyl sulfonium salt methacrylate as PAG was synthesized and copolymerized with crosslinkable glycidyl methacrylate and methyl methacrylate by radical reaction for a new PAG bound polymer resist. The characterization of resist polymers was carried out by H-1 NMR. The lithographic performance of photoresists was investigated by ArF lithography. Both PAG bound resist and the PAG blended resist were employed to demonstrate the effect of PAG unit in a resist system. The polymer bound PAG resist improved the LEA and showed a higher resolution than the PAG blend resist.
URI
http://www.ingentaconnect.com/content/asp/jnn/2015/00000015/00000002/art00132http://hdl.handle.net/20.500.11754/22366
ISSN
1533-4880; 1533-4899
DOI
http://dx.doi.org/10.1166/jnn.2015.9330
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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